The technology in an Intel chip that enabled the fabrication of 45 nm microprocessors in 2007. As elements in the chip were being reduced to 45 nanometers, the gate dielectric began to lose its ...

Qualcomm CDMA Technologies said it will not use a high-k/metal gate (HKMG) process for most of the chips it makes at the 28 nm node, sticking with a poly/SiON gate stack. The company described the ...

Thin films and high-k dielectrics continue to be at the forefront of electronic device engineering, offering transformative solutions for enhanced performance and scaling in modern semiconductor ...

In the field of semiconductor fabrication, high-k dielectrics represent a class of materials with a dielectric constant significantly higher than traditional silicon dioxide. These materials are ...

Tokyo — NEC Corp. and NEC Electronics Corp. have gained confidence that they can incorporate a high-k dielectric in their chip-making processes next year because of a breakthrough in determining the ...

San Jose, Calif. — Three entities–IBM, Intel and Sematech–have separately disclosed breakthroughs in the development of high-k dielectrics and metal gates for use in advanced gate stack applications ...