EDN

Tanner EDA and IC Mask Design Collaborate on Tools to Accelerate Analog Layout Design

MONROVIA, California – March 2, 2010 – Tanner EDA, the catalyst for innovation for the design, layout and verification of analog and mixed-signal integrated circuits (ICs) and IC Mask Design, an ...
EDN

Tanner EDA, IC Mask Design to boost analog layout design

PARIS — Tanner EDA, a division of Tanner Research Inc. (Monrovia, Calif.), and IC Mask Design Ltd. (Limerick,Ireland) have joined forces to develop a toolset aimed at accelerating analog layout design ...
MacTech

Apple scoops up IC Mask Design for semiconductor improvement

As noted by AppleInsider, according to the European Union’s list of acquisitions by firms it classes as gatekeepers, Apple has acquired IC Mask Design. Under the Digital Markets Act, Apple is required ...
Electronic Design

Accelerate IC design with shift-left pattern matching

As the complexity of IC designs continues to grow, moving critical checks earlier in the design cycle helps designers identify and resolve issues before they escalate, streamlining the overall ...
Semiconductor Engineering

Combining CMOS IC And MEMS Design For IoT Edge Devices

Creating a sensor-based IoT edge device is challenging, due to the multiple design domains involved. But, creating an edge device that combines the electronics using the traditional CMOS IC flow and a ...
Electronic Design

A Look Behind the Mask of Multi-Patterning

Michael White, director of product marketing, Calibre Physical Verification products, Mentor Graphics At the rate that new technology nodes keep racing by, it sure feels like we’re speeding down the ...